Chip package and method for forming the same

ABSTRACT

A chip package includes: a substrate; a signal pad and a ground pad disposed on the substrate; a first and a second conducting layers disposed on the substrate and electrically connected to the signal pad and the ground pad, respectively, wherein the first and the second conducting layers extend from an upper surface of the substrate towards a lower surface of the substrate along a first and a second side surfaces of the substrate, respectively, and the first and the second conducting layers protrude from the lower surface; and a protection layer disposed on the substrate, wherein the protection layer completely covers the entire portion of the first conducting layer located on the first side surface of the substrate, and the entire portion of the second conducting layer located on the second side surface of the substrate is not covered by the protection layer.

CROSS REFERENCE TO RELATED APPLICATIONS

This Application claims priority of China Patent Application No.201110057693.4, filed on Mar. 10, 2011, the entirety of which isincorporated by reference herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to a chip package, and in particular relates to achip package having an electromagnetic interference (EMI) shieldingstructure and fabrication method thereof.

2. Description of the Related Art

As sizes of chip packages continue to become thinner and lighter andsignal transmission speed continues to increase, electromagneticinterference (EMI) and electrostatic discharge (ESD) problems for chippackages have worsened. Because sizes of chip packages continue to getsmaller, design of ground wiring in chip packages have become moreimportant. In addition, quality of a signal wire directly influencesoperation of a chip. Therefore, it is desired to have a chip packageprovided with an EMI shielding structure, ensuring signal wire quality.

BRIEF SUMMARY OF THE INVENTION

According to an embodiment of the present invention, a chip package isprovided. The chip package includes: a substrate; a signal conductingpad disposed on the substrate; a ground conducting pad disposed on thesubstrate; a first conducting layer disposed on the substrate andelectrically connected to the signal conducting pad, wherein the firstconducting layer extends from an upper surface of the substrate towardsa lower surface of the substrate along a first side surface of thesubstrate, and the first conducting layer protrudes from the lowersurface; a second conducting layer disposed on the substrate andelectrically connected to the ground conducting pad, wherein the secondconducting layer extends from the upper surface of the substrate towardsthe lower surface of the substrate along a second side surface of thesubstrate, and the second conducting layer protrudes from the lowersurface; and a protection layer disposed on the substrate, wherein theprotection layer completely covers the entire portion of the firstconducting layer located on the first side surface of the substrate, andthe entire portion of the second conducting layer located on the secondside surface of the substrate is not covered by the protection layer.

According to an embodiment of the present invention, a method forforming a chip package is provided. The method includes: providing asubstrate, wherein a signal conducting pad and a ground conducting padare located on the substrate; removing a portion of the substrate froman upper surface of the substrate to form a first hole and a second holeextending towards a lower surface of the substrate, wherein the firsthole exposes the signal conducting pad and a second hole exposes theground conducting pad; forming a first conducting layer on the uppersurface of the substrate, wherein the first conducting layer extends ona sidewall and a bottom of the first hole to electrically connect to thesignal conducting pad, and the first conducting layer protrudes from thelower surface; forming a second conducting layer on the upper surface ofthe substrate, wherein the second conducting layer extends on a sidewalland a bottom of the second hole to electrically connect to the groundconducting pad, and the second conducting layer protrudes from the lowersurface; forming a patterned protection layer on the upper surface ofthe substrate, wherein a portion of the patterned protection layer fillsinto the first hole to cover the first conducting layer in the firsthole; performing a first dicing process to remove a portion of thepatterned protection layer in the first hole such that a side surface ofthe first conducting layer is exposed in the first hole and remove aportion of the second conducting layer on the bottom of the second hole;forming a second patterned protection layer on the upper surface of thesubstrate, wherein the second patterned protection layer fills into thefirst hole and covers the patterned protection layer in the first holeand the side surface of the first conducting layer; and performing asecond dicing process to remove a portion of the second patternedprotection layer in the first hole and form a plurality of separate chippackages, wherein the second patterned protection layer remaining in thefirst hole covers the side surface of the first conducting layer.

A detailed description is given in the following embodiments withreference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention can be more fully understood by reading thesubsequent detailed description and examples with references made to theaccompanying drawings, wherein:

FIGS. 1-8B are cross-sectional views showing the steps of forming a chippackage according to an embodiment of the present invention; and

FIG. 9 is an illustrative three-dimensional view showing a chip packageaccording to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

The following description is of the best-contemplated mode of carryingout the invention. This description is made for the purpose ofillustrating the general principles of the invention and should not betaken in a limiting sense. The scope of the invention is best determinedby reference to the appended claims.

The manufacturing method and method for use of the embodiment of theinvention are illustrated in detail as follows. It is understood, thatthe following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. In addition, the present disclosure mayrepeat reference numbers and/or letters in the various examples. Thisrepetition is for the purpose of simplicity and clarity and does not initself dictate a relationship between the various embodiments and/orconfigurations discussed. Furthermore, descriptions of a first layer“on,” “overlying,” (and like descriptions) a second layer, includeembodiments where the first and second layers are in direct contact andthose where one or more layers are interposing the first and secondlayers.

A chip package according to an embodiment of the present invention maybe used to package a variety of chips. For example, the chip package ofthe embodiments of the invention may be applied to package chipsincluding, for example, active or passive devices, or electroniccomponents with digital or analog circuits, such as opto electronicdevices, micro electro mechanical systems (MEMS), micro fluidic systems,and physical sensors for detecting heat, light, or pressure.Particularly, a wafer scale package (WSP) process may be applied topackage semiconductor chips, such as image sensor devices,light-emitting diodes (LEDs), solar cells, RF circuits, accelerators,gyroscopes, micro actuators, surface acoustic wave devices, pressuresensors, ink printer heads, or power IC modules.

The wafer scale package process mentioned above mainly means that afterthe package process is accomplished during the wafer stage, the waferwith chips is cut to obtain separate independent packages. However, in aspecific embodiment, separate independent chips may be redistributedoverlying a supporting wafer and then be packaged, which may also bereferred to as a wafer scale package process. In addition, the abovementioned wafer scale package process may also be adapted to form chippackages of multi-layer integrated circuit devices by stacking aplurality of wafers having integrated circuits. In one embodiment, afterthe dicing process is performed, the obtained chip package is a chipscale package (CSP). The size of the chip scale package (CSP) may beonly slightly larger than the size of the packaged chip. For example,the size of the chip scale package is not larger than 120% of the sizeof the packaged chip.

FIGS. 1-8B are cross-sectional views showing the steps of forming a chippackage according to an embodiment of the present invention. As shown inFIG. 1, a substrate 100 is provided, which has a surface 100 a and asurface 100 b. The substrate 100 may be, for example, a semiconductorsubstrate, ceramic substrate, or another suitable substrate. In oneembodiment, the substrate 100 is a semiconductor wafer (such as asilicon wafer), and a wafer-level packaging process may be performed toreduce fabrication time and cost.

In one embodiment, at least a device region 106 may be disposed orformed on or in the substrate 100. For example, if the substrate 100 isa semiconductor substrate, the device region 106 may be formed in thesubstrate 100 in advance by using a semiconductor manufacturing process(such as a doping process and a heat treatment process). As shown inFIG. 1, in one embodiment, the device region 106 may be formed in thesubstrate 100, which may be adjacent to the surface 100 b of thesubstrate 100. In another embodiment, the substrate 100 is a ceramicsubstrate. In this case, the device region 106 may be a chip which isdisposed on the substrate 100. The device region 106 may be disposed onthe surface of the substrate 100. Alternatively, a recess may be formedin the substrate 100 in advance, which may be used to accommodate thedevice region 106. The device region 106 may include a variety of activedevices and/or passive devices. In subsequent descriptions, an imagesensor chip package will be taken as an example for illustration. Inthis case, the device region 106 may include an image sensor device.

In one embodiment, a plurality of conducting pads 102 may be disposed onthe substrate 100. As shown in the embodiment in FIG. 1, a dielectriclayer 104 may be formed on the surface 100 b of the substrate 100. Aplurality of conducting pads 102 may be formed in the dielectric layer104. The conducting pads 102 may include at least a signal conductingpad and at least a ground conducting pad. The signal pad may beelectrically connected to elements in the device region 106 throughconducting routes formed in the dielectric layer. The ground conductingpad may be electrically connected to a protection circuit throughconducting routes formed in the dielectric layer 106. The protectioncircuit may be used to prevent electrostatic discharge current generatedduring the fabrication or use of the chip package from impacting theelements in the device region 106 and/or prevent electromagneticinterference. In addition, in one embodiment, the conducting pad 102 mayinclude an annular conducting pad having a through-hole located at acenter portion.

As shown in FIG. 1, in one embodiment, a carrier substrate 108 may beoptionally disposed on the surface 100 b of the substrate 100 tofacilitate subsequent processes. A spacer layer 110 may be disposedbetween the carrier substrate 108 and the substrate 100. In oneembodiment, the spacer layer 110, the carrier substrate 108, and thesubstrate 100 may together surround a substantially closed cavity underthe device region 106. In one embodiment, the device region 106 includesan image sensor device. In this case, a microlens array 112 may bedisposed in the cavity to improve the light receiving capability of thedevice region 106. In addition, a transparent substrate (such as a glasssubstrate, quartz substrate, transparent polymer substrate, or the like)may be chosen to be the carrier substrate 108. In one embodiment, thespacer layer 110 may be a polymer material. In one embodiment, thespacer layer 110 may be located directly below the conducting pad 102.

Next, as shown in FIG. 2, the substrate 100 may be optionally thinned tofacilitate subsequent processes. In one embodiment, the carriersubstrate 108 may be used as a support, and a thinning process isperformed to the surface 100 a of the substrate 100 to thin down thesubstrate 100 to a suitable thickness. A suitable thinning processesincludes, for example, a mechanical grinding process or a chemicalmechanical polishing process.

After the optional thinning process is performed, a portion of thesubstrate 100 is removed from the surface 100 a of the substrate 100 toform holes exposing the conducting pads 102. As shown in FIG. 2, aphotolithography process and an etching process may be, for example,performed to form holes 116 a. The dielectric layer 104 is exposed atbottoms of the holes 116 a.

Next, as shown in FIG. 3, an insulating layer 114 is formed on thesurface 100 a of the substrate 100. The insulating layer 114 may fillinto the holes 116 a to cover sidewalls and bottoms of the holes 116 a.The material of the insulating layer 114 may include, for example, (butis not limited to) an epoxy resin, a solder mask material, or othersuitable insulating materials, such as inorganic materials includingsilicon oxide, silicon nitride, silicon oxynitride, metal oxide, orcombinations thereof, or organic polymer materials including polyimide,butylcyclobutene (BCB, Dow Chemical Co.), parylene, polynaphthalenes,fluorocarbons, or acrylates and so on. The insulating layer 114 may beformed by using a coating process, such as spin coating process, spraycoating process, or curtain coating process, or other suitabledeposition methods, such as liquid phase deposition, physical vapordeposition, chemical vapor deposition, low pressure chemical vapordeposition, plasma enhanced chemical vapor deposition, rapid thermalchemical vapor deposition, or atmospheric pressure vapor deposition.

However, in one embodiment, it should be appreciated that the formationof the insulating layer 110 is not necessary. In the case that no shortcircuiting issue exists between a subsequently formed conducting layerand the substrate, the insulating layer 114 may not need to be formed.For example, if the material of the substrate 100 is not a conductivematerial, the insulating layer 114 may not need to be formed.

Then, a notching process is performed such that the hole 116 a extendsalong a direction towards the conducting pad 102 to form a hole 116. Thenotching process may be performed by using, for example, a dicing blade.The holes 116 expose side surfaces of the conducting pads 102, whereinparts of the holes 116 expose side surfaces of the signal conductingpads, and other parts of the holes 116 expose side surfaces of theground conducting pads. In one embodiment, the hole 116 may penetratethrough the conducting pad 102. In another embodiment, the bottom of thehole 116 is located under the conducting pad 102 and located in thedielectric layer 104. In yet another embodiment, the hole 116 mayfurther penetrate through the dielectric layer 104 to extend into thespacer layer 110. The bottom of the hole 116 may be located in thespacer layer 110. In one embodiment, the conducting pad 102 is anannular conducting pad having a through-hole located at a canterportion. Thus, the notching process may be performed more smoothly. Inaddition, in one embodiment, the hole 116 has an inclined sidewall. Forexample, in one embodiment, a width of the hole 116 near the surface 100a may be larger than a width of the hole 116 near the surface 100 b. Inanother embodiment, a width of the hole 116 near the surface 100 a maybe smaller than a width of the hole 116 near the surface 100 b.

As shown in FIG. 4, a conducting material layer 118 is then formed onthe surface 100 a of the substrate 100. The conducting material layer118 may extend onto the sidewall and the bottom of the hole 116 to beelectrically connected to the conducting pad 102. Because the hole 116exposes the conducting pad 102, the conducting material layer 118 formedtherein will protrude from the surface 100 b of the substrate 100. Thematerial of the conducting material layer 118 may include (but is notlimited to) copper, aluminum, gold, platinum, or the like. Thefabrication method of the conducting material layer may include (but isnot limited to) a physical vapor deposition process, sputtering process,chemical vapor deposition process, electroplating process, orelectroless plating process.

Then, the conducting material layer 118 is patterned according torequirements to form a conducting layer 118 a and a conducting layer 118b which are electrically connected to a ground conducting pad 102 a anda signal conducting pad 102 b, as shown in FIGS. 5A and 5B, whereinFIGS. 5A and 5B respectively show cross-sectional views of different tworegions of the substrate (and the following FIGS. 6A, 7A, and 8A andFIGS. 6B, 7B, and 8B are cross-sectional views illustrating thefabrication process steps in the two regions. In FIG. 5A, the conductinglayer 118 a extends from the surface 100 a of the substrate 100 into thehole 116 exposing the side surface of the ground conducting pad 102 aand electrically contacts with the ground conducting pad 102 a, whereina contact region between the conducting layer 118 a and the groundconducting pad 102 a is located between a top terminal and a bottomterminal of the conducting layer 118 a. In FIG. 5B, the conducting layer118 b extends from the surface 100 a of the substrate 100 into the hole116 exposing the side surface of the signal conducting pad 102 b andelectrically contacts with the signal conducting pad 102 b, wherein acontact region between the conducting layer 118 b and the signalconducting pad 102 b is located between a top terminal and a bottomterminal of the conducting layer 118 b.

Then, as shown in FIGS. 5A and 5B, a patterned protection layer 120 isformed on the surface 100 a of the substrate 100. The formation methodof the patterned protection layer 120 may include forming a protectionmaterial layer on the surface 100 a of the substrate 100, and performingan exposure process, development process, and curing process to theprotection material layer. The patterned protection layer 120 includes,for example, (but is not limited to) a solder mask material such asgreen paint.

As shown in FIG. 5A, the patterned protection layer 120 is located onthe conducting layer 118 a and has openings exposing the conductinglayer 118 a, wherein conducting bumps may be formed in the openings in asubsequent process. In addition, there is substantially no protectionlayer 120 in the hole 116 having the conducting layer 118 a formedtherein. Thus, the portion of the conducting layer 118 a located in thehole 116 is substantially and/or completely exposed without beingcovered by the patterned protection layer 120.

As shown in FIG. 5B, the patterned protection layer 120 is located onthe conducting layer 118 b and has openings exposing the conductinglayer 118 b, wherein conducting bumps may be formed in the openings in asubsequent process. In addition, the patterned protection layer 120further extends into the hole 116 having the conducting layer 118 bformed therein. In one embodiment, the patterned protection layer 120may substantially and/or completely be filled into the hole 116 havingthe conducting layer 118 b formed therein.

Then, a first dicing process (or so-called pre-dicing process) isperformed to cut through a portion of the conducting layer on the bottomof the hole 116. As shown in FIG. 6A, the first dicing process includescutting through the conducting layer 118 a located on the bottom of thehole and electrically connecting the ground conducting pad 102 a to forma notch 6 a. A diced surface (or so-called side surface) of theconducting layer 118 a at the bottom of the hole is exposed in the hole.In addition, in one embodiment, the hole 116 may serve as an alignmentmark of a subsequent dicing process.

As shown in FIG. 6B, the first dicing process further includes cuttingand removing the patterned protection layer 120 in the hole and cuttingthrough the conducting layer 118 b located on the bottom of the hole andelectrically connecting the signal conducting pad 102 b to form a notch6 b. A diced surface (or so-called side surface) of the conducting layer118 b at the bottom of the hole is exposed in the hole.

Next, a second patterned protection layer is formed on the surface 100 aof the substrate 100. As shown in FIG. 7A, the second patternedprotection layer substantially and/or completely does not fill into thehole exposing the conducting layer 118 a. Thus, the conducting layer 118a and the diced surface (or so-called side surface) remains exposed inthe hole.

As shown in FIG. 7B, the second patterned protection layer 122 fillsinto the notch 6 b (see FIG. 6B). In one embodiment, the materials ofthe second patterned protection layer 122 and the patterned protectionlayer 120 may be the same. In another embodiment, the material of thesecond patterned protection layer 122 may be different from that of thepatterned protection layer 120. In one embodiment, the patternedprotection layer 120 and the second patterned protection layer 122 aresubstantially and/or completely filled into the hole. The secondpatterned protection layer 122 covers a portion of the patternedprotection layer 120 and covers the diced surface (or so-called sidesurface) of the conducting layer 118 b originally exposed at the bottomof the hole.

In one embodiment, the patterned protection layer 120 and the secondpatterned protection layer 122 directly contact with each other, and acontact interface 124 may be formed therebetween. In this case, thediced surface (or so-called side surface) of the conducting layer 118 bis substantially coplanar with the contact interface 124. In oneembodiment, the contact interface 124 may be observed by using, forexample, electron microscopy. However, in some embodiments, it should beappreciated that the contact interface 124 may not exist, not be easilyobserved, or disappear in subsequent processes due to the factors suchas the material and/or the fabrication process of the patternedprotection layer 120 and the second patterned protection layer 122.

Next, conducting bumps may be optionally formed on the surface 100 a ofthe substrate 100. As shown in FIG. 7A, conducting bumps 126 may beformed in the openings of the protection layer 120 on the surface 100 aof the substrate 100 to electrically contact with the conducting layer118 a thereunder. In one embodiment, the conducting bump 126 a may helpto lead current (such as an electrostatic discharge current) out fromthe ground conducting pad 102 a. In one embodiment, the conducting bump126 a may not be electrically connected to the ground conducting pad 102a and serve as a dummy conducting bump which may be used to balance anencountered force.

As shown in FIG. 7B, conducting bumps 126 b may be formed in theopenings of the protection layer 120 on the surface 100 a of thesubstrate 100 to electrically contact with the conducting layer 118 bthereunder. In one embodiment, the conducting bump 126 b is electricallyconnected to the device region 106 through the conducting layer 118 band the signal conducting pad 102 b. The conducting bump 126 b maytherefore be used to input an electrical signal into and/or output anelectrical signal from the device region 106 such that the chip canoperate.

Then, a second dicing process is performed along predetermined scribelines (penetrating through the notches) to form a plurality of separatechip packages. In one embodiment, a thickness of a dicing blade used inthe second dicing process is thinner than that used in the first dicingprocess.

As shown in FIG. 8A, in the embodiment where the spacer layer 110 andthe carrier substrate 108 are formed, the second dicing process includescutting and removing a portion of the spacer layer 110 and the carriersubstrate 108. In the embodiment where the spacer layer 110 and thecarrier substrate 108 are not formed (for example, the hole only extendsto the bottom terminal of the conducting layer 118 a), the second dicingprocess may substantially not cut the material in the hole exposing theconducting layer 118 a. After the second dicing process is performed,the sidewall of the hole now is a side surface of the substrate portionof one of the chip packages. In one embodiment, because the hole has aninclined sidewall, the side surface of the substrate portion of the chippackage is an inclined side surface.

As shown in FIG. 8B, the second dicing process further includes dicingand removing a portion of the second patterned protection layer 122. Inone embodiment, because a thinner dicing blade is used in the seconddicing process, the second patterned protection layer 122 is notcompletely removed. Thus, as shown in FIG. 8B, the diced surface (orso-called side surface) of the conducting layer 118 b in the hole formedduring the first dicing process is still completely covered by theremaining second patterned protection layer 122. Thus, the patternedprotection layer 120 and the second patterned protection layer 122 maycompletely cover the portion of the conducting layer 118 b located onthe side surface of the substrate 100 and electrically connected to thesignal conducting pad 102 b. Thus, the conducting layer 118 b may befully protected to ensure output and/or input of electrical signals.

FIG. 9 is an illustrative three-dimensional view showing a chip packageaccording to an embodiment of the present invention, which shows one ofthe formed chip packages after the dicing process, wherein same orsimilar reference numbers are used to designate same or similarelements. Also referring to FIGS. 8A, 8B, and 9, the formed chip packagemay have the conducting layer 118 b electrically connected to the signalconducting pad 102 b. The conducting layer 118 b may extend from theupper surface 100 a of the substrate 100 towards the lower surface 100 bof the substrate 100 along the side surface of the substrate 100 (suchas the side surface covered by the conducting layer 118 b shown in FIG.9), wherein the conducting layer 118 b may protrude from the lowersurface 100 b. Moreover, for the conducting layer 118 b, beside thecontact region with the conducting bump 126 b, the conducting layer 118b may be substantially and/or completely covered by the patternedprotection layer 120 and the second patterned protection layer 122.Thus, quality of the conducting layer 118 b may be ensured.

In addition, the formed chip package may also have the conducting layer118 a electrically connected to the ground conducting pad 102 a. Theconducting layer 118 a may extend from the upper surface 100 a of thesubstrate 100 towards the lower surface 100 b of the substrate 100 alonga side surface of the substrate 100 (such as the side surface covered bythe conducting layer 118 a shown in FIG. 9), wherein the conductinglayer 118 a may protrude from the lower surface 100 b. Taking theembodiment shown in FIG. 9 as an example, the conducting layer 118 a maybe located on a corner portion of the substrate 100 to cover twoadjacent side surfaces. For the conducting layer 118 a, the entireportion of the conducting layer 118 a located on the side surface of thesubstrate 100 substantially is not covered by any protection layer.Thus, there is an exposed conducting layer on the side surface of thesubstrate of the chip package according to the embodiment of theinvention, wherein the exposed conducting layer is electricallyconnected to the ground conducting pad. The exposed (ground) conductinglayer may be easily connected to another electronic element such thatelectrostatic discharge current may be led out or the influence ofelectromagnetic interference may be reduced.

While the invention has been described by way of example and in terms ofthe preferred embodiments, it is to be understood that the invention isnot limited to the disclosed embodiments. To the contrary, it isintended to cover various modifications and similar arrangements (aswould be apparent to those skilled in the art). Therefore, the scope ofthe appended claims should be accorded the broadest interpretation so asto encompass all such modifications and similar arrangements.

What is claimed is:
 1. A chip package, comprising: a substrate; a signalconducting pad disposed on the substrate; a ground conducting paddisposed on the substrate; a first conducting layer disposed on thesubstrate and electrically connected to the signal conducting pad,wherein the first conducting layer extends from an upper surface of thesubstrate towards a lower surface of the substrate along a first sidesurface of the substrate, and the first conducting layer protrudes fromthe lower surface; a second conducting layer disposed on the substrateand electrically connected to the ground conducting pad, wherein thesecond conducting layer extends from the upper surface of the substratetowards the lower surface of the substrate along a second side surfaceof the substrate, and the second conducting layer protrudes from thelower surface; and a protection layer disposed on the substrate, whereinthe protection layer completely covers the entire portion of the firstconducting layer located on the first side surface of the substrate, andthe entire portion of the second conducting layer located on the secondside surface of the substrate is not covered by the protection layer. 2.The chip package as claimed in claim 1, wherein the protection layer hasa first protection layer and a second protection layer, and the firstprotection layer directly contacts with the second protection layer suchthat a contact interface is formed between the first protection layerand the second protection layer.
 3. The chip package as claimed in claim2, wherein a side surface of the first conducting layer is coplanar withthe contact interface.
 4. The chip package as claimed in claim 3,wherein the second protection layer completely covers the side surfaceof the first conducting layer.
 5. The chip package as claimed in claim1, further comprising: a carrier substrate disposed on the lower surfaceof the substrate; and a spacer layer disposed between the carriersubstrate and the lower surface of the substrate.
 6. The chip package asclaimed in claim 5, wherein the first conducting layer and the secondconducting layer extend into the spacer layer.
 7. The chip package asclaimed in claim 6, wherein a portion of the protection layer extendsinto the spacer layer.
 8. The chip package as claimed in claim 1,further comprising a first conducting bump disposed on the upper surfaceof the substrate, wherein the first conducting bump is electricallyconnected to the first conducting layer.
 9. The chip package as claimedin claim 1, further comprising a second conducting bump disposed on theupper surface of the substrate, wherein the second conducting bump iselectrically connected to the second conducting layer.
 10. The chippackage as claimed in claim 1, wherein a contact region between thefirst conducting layer and the signal conducting pad is located betweena top terminal and a bottom terminal of the first conducting layer, anda contact region between the second conducting layer and the groundconducting pad is located between a top terminal and a bottom terminalof the second conducting layer.
 11. A method for forming a chip package,comprising: providing a substrate, wherein a signal conducting pad and aground conducting pad are located on the substrate; removing a portionof the substrate from an upper surface of the substrate to form a firsthole and a second hole extending towards a lower surface of thesubstrate, wherein the first hole exposes the signal conducting pad anda second hole exposes the ground conducting pad; forming a firstconducting layer on the upper surface of the substrate, wherein thefirst conducting layer extends on a sidewall and a bottom of the firsthole to electrically connect to the signal conducting pad, and the firstconducting layer protrudes from the lower surface; forming a secondconducting layer on the upper surface of the substrate, wherein thesecond conducting layer extends on a sidewall and a bottom of the secondhole to electrically connect to the ground conducting pad, and thesecond conducting layer protrudes from the lower surface; forming apatterned protection layer on the upper surface of the substrate,wherein a portion of the patterned protection layer fills into the firsthole to cover the first conducting layer in the first hole; performing afirst dicing process to remove a portion of the patterned protectionlayer in the first hole such that a side surface of the first conductinglayer is exposed in the first hole and remove a portion of the secondconducting layer on the bottom of the second hole; forming a secondpatterned protection layer on the upper surface of the substrate,wherein the second patterned protection layer fills into the first holeand covers the patterned protection layer in the first hole and the sidesurface of the first conducting layer; and performing a second dicingprocess to remove a portion of the second patterned protection layer inthe first hole and form a plurality of separate chip packages, whereinthe second patterned protection layer remaining in the first hole coversthe side surface of the first conducting layer.
 12. The method forforming a chip package as claimed in claim 11, further comprisingdisposing a spacer layer on the lower surface of the substrate beforethe first hole and the second hole are formed.
 13. The method forforming a chip package as claimed in claim 12, further comprisingdisposing a carrier substrate on the spacer layer.
 14. The method forforming a chip package as claimed in claim 13, wherein the first holeand the second hole extend into the spacer layer.
 15. The method forforming a chip package as claimed in claim 14, wherein the step ofperforming the first dicing process comprises removing a portion of thespacer layer under the bottom of the first hole and the bottom of thesecond hole.
 16. The method for forming a chip package as claimed inclaim 15, wherein the step of performing the first dicing processcomprises removing a portion of the carrier substrate.
 17. The methodfor forming a chip package as claimed in claim 16, wherein the step ofthe second dicing process comprises cutting through the carriersubstrate.
 18. The method for forming a chip package as claimed in claim11, wherein the first conducting layer and the second conducting layerare simultaneously formed.
 19. The method for forming a chip package asclaimed in claim 11, further comprising disposing a first conductingbump on the substrate, wherein the first conducting bump is electricallyconnected to the first conducting layer.
 20. The method for forming achip package as claimed in claim 11, further comprising disposing asecond conducting bump on the substrate, wherein the second conductinglayer is electrically connected to the second conducting layer.